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Oxidator150

真空焊接炉vlo20

 

High-temperature Oxidator furnace

The Oxidator 150 is a high-temperature furnace, especially designed for the oxidation of silicon carbide (SiC) by centrotherm thermal solutions. Its capability to run high process temperatures of up to 1400°C and oxidation processes using O2, N2O, NO, NO2 or WetOx atmosphere makes for an excellent combination of flexibility and proven process quality. Equipped with metal-free heating and double vacuum, the Oxidator 150 is currently the safest ToxGas oxidation furnace on the market .

Batch processing of 2“, 3“, 100 mm und 150 mm wafers or any combination

  • Maximum heating rate up to 7.5 K/min
  • Batch size up to 50 (150 mm) wafers
  • Process pressure range from 850 mbar to atmospheric pressure

 

Applications

  • Oxidator

 

 

 

 
 
 

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